No Product Specs
Seebeck Coefficient / Electric Resistance Measuring System
ULVAC Technologies Products
Advantge™ III Processes Post high dose implant strip.
Advantge™ Processes Post via etch strip (no post solvent clean required).
Alpps™ Ultra Low k Process No top residue reducing need for post-ash wet clean. No low k voids.
CE-300I High-Density Plasma Etching System It is a multipurpose high-density plasma etching system, especially for test facilities such as
CME200 A CVD system for silicon oxide films and nitride films using SiH4 and TEOS. Can create high-quality films using high frequency
CVD Systems for LCD / Solar Cells The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH4 or TEOS
Enviro™ III Platform Modular design to accept roll-up process modules
Enviro™ III Process Modules Designed for challenging resist and residue removal applications
Enviro Optima™ The Enviro Optima™ Resist Strip System is the smallest 300mm resist strip system providing the highest throughput per square meter of
Enviro Xceed400 - Resist Strip System The ENVIRO-Xceed400 advanced plasma resist strip system from ULVAC is the latest photoresist removal equipment
Handy Arc Welder - HA-1H Handy Arc Welder - HA-1H
Handy Spot Welder - HS-9000 Universal handy type spot welder is designed for spot welding a fine thermocouple wire onto specimen such as thin
LaserPIT The principle of the measurement method is shown below. A portion of a rectangular film specimen is heated by a modulated laser beam, which
MILA-5000 Mini Lamp Annealer This compact table top RTP system is built around a gold reflector IR furnace equipped with a high precision temperature
NLD-6000 NLD-6000 provides superior solutions for processes from mask deposition through mask material etching and quartz etching.
PDP Display Equipment The ECH Series are in-line evaporation systems for deposition of MgO films. They contain pierce type electronic-gun EB
Seebeck Coefficient / Electric Resistance Measuring System Thermal power generation is a method of generating power based on the thermoelectric effect
Si for MEMS This system incorporated technology of high-speed silicon etching. The model range are available from prototypes for R&D to multi-chamber
SMD-X Systems With the increase in size of LC panels and manufacturing mother glass, manufacturing equipment has also become larger, requiring
SME Series The SME Series is a series of space-saving, low-cost cluster-type sputtering systems ideal for SAW devices and compound semiconductors
Sputter Systems for Display Panels / Solar Cells The SDP Series are in-line sputtering systems for deposition of ITO films and other metal films.
Sputter Systems for LCD / Solar Cells The SMD Series are single-substrate sputtering systems for deposition of films such as metal films and ITO films.
TC9000 Rapid Thermal Processing (RTP) has become an important heating technique for annealing semiconductors, ferroelectrics and other thin film
ULHITE NE-7800H ULHITE NE-7800H is a high-temperature etching system for non-volatile materials (difficult-to-etch materials) such as FeRAM-MRAM
ULK Series Oil Diffusion Pumps ULVAC has drawn on a wealth of experience in evacuation technology to redesign the ULK Series of oil diffusion pumps to
VEP-1000 Series VEP Series models are systems for deposition of various organic and inorganic materials by methods including evaporation, sputtering